The effect of self-absorption in hollow cathode lamp on its temperature
|
|
- Diane Nichols
- 6 years ago
- Views:
Transcription
1 Plasma Science and Applications (ICPSA 2013) International Journal of Modern Physics: Conference Series Vol. 32 (2014) (9 pages) The Author DOI: /S The effect of self-absorption in hollow cathode lamp on its temperature Samad Sobhanian Department of atomic and molecular physics, East Azerbaijan Science and Research Branch, Islamic Azad University, Tabriz, Iran Hamid Naghshara Department of solid state physics, University of Tabriz, Tabriz, Iran Published 13 August 2014 It has been shown experimentally that even a small error in the calculation of the temperature inside the hollow-cathode lamp (HCL) and the current applied to the lamp, may cause a tremendous error in determination of the absorption ratio in optical resonance absorption (ORA) method. This effect is intensified nonlinearity for large absorption ratios. If a higher current is applied to a copper hollow cathode lamp, the copper density inside the lamp is increasing rapidly. Due to the cylindrical (axisymmetric) form of the lamp, the density of atoms around the main axis of the lamp becomes greater than that near the internal wall. In this case the auto-absorption (or self-absorption) is occurred and as its result, the emission spectrum produced by copper atoms is locally absorbed before going out from the lamp. This absorption is stronger near the main axis compared with the areas near the wall because of the Gaussian profile of the spectral line. Two different Cu atoms ground state lines with the similar lower state (327.4 nm and nm) are used in this work as optical resonance absorption and the absorption coefficient is obtained for three different pressures (0.6, 4.5 and 14 µbar). The best values for copper HCL temperature and for maximum HCL current were found respectively 450 K, and 5mA. Keywords: Optical resonance absorption; hollow-cathode lamp; magnetron sputtering. 1. Introduction Thin film deposition is evidently an important key in recent micro-electronic technology. 1,2 Beside this technique is widely used for surface modification and surface treatment in semiconductor industries. 3,4 Low temperature plasmas are used for plasma sputtering. Especially in magnetron discharges; the magnetic field produced by permanent magnets behind the target (cathode) helps to confine the plasma near the target area. In DC plasma sputtering devices, plasma ions, normally from noble gases like argon, are accelerated towards the target which is used as the cathode for the system. The This is an Open Access article published by World Scientific Publishing Company. It is distributed under the terms of the Creative Commons Attribution 3.0 (CC-BY) License. Further distribution of this work is permitted, provided the original work is properly cited
2 S. Sobhanian and H. Naghshara sputtered atoms from the target then are directed towards the substrate and are deposited on its surface. Thus, one can realize thin films of different conducting materials using magnetron plasma sputtering system. The exact knowledge of the sputtering yield and its variation with plasma s main parameter and also the number of sputtered atoms reaching the substrate is a very important problem. One of the most applied method to diagnose the plasma and determine the sputtered atom density is so-called resonance optical absorption (ROA). 5, 6 Having information on the sputtering yield, one can optimize the deposition rate with a great precision by controlling the number of atoms moving toward the substrate and by adjusting the gas pressure. Diffusion of the sputtered atoms towards the chamber walls decreases the deposition rate. Beside the vacuum chamber walls are polluted rapidly and some fraction of the input energy and also the working gas is lost by this unwanted diffusion. This will be very important specially if the target material is expensive. Thus the knowledge of total number of atoms moving in the plasma is necessary for adjusting plasma operation conditions. There are many technique for measuring the number of metal atoms or ions in plasma sputtering devices, Laser absorption (LA), 7 Laser induced fluorescent (LIF), 8 Optical absorption spectroscopy (OAS) 9 and Resonance optical absorption (ROA). Resonance optical absorption (ROA) is among the others the simplest and cheapest way. In this method, only a hollow cathode lamp (HCL) is used as the light source. Using this method one can determine the absolute (total) density of particles absorbing the photons (the density of atoms in the ground state and metastable state). Here for the case of copper target we use a copper hollow cathode lamp. The quantity Io/Ii, the ratio of the output to input light intensities from HCL at dedicated line is very sensitive to the gas temperature. If the applied current to HCL is exceed some given high value, the copper atoms density inside the lamp will be also increased rapidly. In this case because of the cylindrical symmetry of the lamp, the density of atoms near the principal axis of the lamp wills higher than near the internal walls of the copper cylinder inside the HCL. At this point a phenomena known as the auto-absorption or self-absorption is occurred during which the produced emission spectrum of copper is reabsorbed by next copper atoms before they leave the HCL. This absorption will be stronger in the middle pail of the cylinder since there are more Cu atoms. In section II, the experimental arrangement for the ROA of Cu atoms density measurement is given and in section III the effect of self-absorption is explained and the effect of internal temperature of HCL and lamp current is clarified. A brief conclusion from the experimental results will be finally presented. 2. Experimental The resonance optical absorption (ROA) method is used to measure the density of atoms sputtered in plasma sputtering unit. The main system, MECA-2000 is co-sputtering (DC & RF) plasma source in operation at Thin Film Deposition laboratory of Tabriz University. The vacuum chamber is a cylinder of 60 cm in diameter and 50 cm height made of stainless steel. This system has two separate magnetron using water cooled metallic target
3 The effect of self-absorptionin hollow cathode lamp of 7.5 cm diameter. One of the magnetrons is connected to a MHz RF source via a matching box and the other one to a DC supply. The number of magnets used in each magnetron is 22 and the magnetic field produced by these magnets on the surface of the target is 40mT. In this research we used the DC magnetron and a target made of 99% copper. The chamber is kept by an Alkatel turbomolecular pump (model ATP900) at a pressure of ~5x10-5 mbar. Argon (99.999%) and nitrogen (99%) gases are used as the working gases in our experiment. The pressure range was 0.3 mbar- 14 mbar. To measure the gas temperature from nitrogen molecular rotational temperature, an admixture of 5% nitrogen is used. The HV power supply used in this system can produce a DC 1000 Volts with the final power of 1 KW. The substrate holder has a diameter of 10 cm and is located at 18 cm from the target. The deposition rate on the substrate is controlled and measured by a quartz micro balance cell. The final precision for the deposition rate measurement is 0.1 A/sec. The vacuum chamber has several observation ports and windows for spectroscopic purposes. The detailed description of the experimental setup is given in the Ref. 10 and 11. Fig. 1. Experimental setup. There exist possibility in the system to heat the substrate holder up to 500 C and one can locate simultaneously 6 substrates on the holder. Each can be brought in front of the target by a motor driven from outside. The experimental layout is shown in Fig. 1. As shown in this figure, the light from the HCL collimated by a quartz lens with a focal length of 10 cm enters the vacuum chamber through a quartz window (6) and after passing through a 5 cm tube (9) enters the plasma medium. The copper atoms existing inside the plasma, absorbs some percentages of the light. On the other hand, the copper atoms themselves emit similar spectral light. The remaining light from HCL together with the light produced by Cu atoms inside the
4 S. Sobhanian and H. Naghshara vacuum chamber after passing the 35 cm tube (9) enters the monochromator (10), through a second quartz lens with 5 cm focal distance. The spectral light is separated inside the monochromator from other lights and enters the photomultiplier tube (11). The detector counts the number of arriving photons and sends counts via RS-232 interface to the computer (12). The turbomolecular pump is connected to the chamber via the port (15). The unit (13) in the figure is a pulse generator that triggers signal for the setup. The power supply provides a 650 DC voltage (4) for supplying of the HCL with a ballast resistor in order to control the current. The detail of the method and required formulation for measuring Cu atoms density are given in Ref. 10 and 11. The temperature of Cu atoms inside the plasma is supposed to be equal to the working gas (Ar-N2) temperature. Thus the gas temperature is measured via N 2 molecule rotational emission light. The result of the measured variation of the number density with the input power and for three different pressures (0.3 µbar, 4.5 µbar and 14 µbar) are given in the reference 10,11 for Cu atoms in ground state and also in metastable state. For the ground state of Cu, the nm line and for the metastable state the nm lines are used. 3. Gas temperature As it has been pointed out earlier, the gas temperature is obtained by adding 5% nitrogen to the working gas. For this purpose, the experimental arrangement of Fig. 2 is used. The result for gas temperature for different applied magnetron powers and for three Fig. 2. Gas temperature measurement. pressures (0.6, 4.5 and 14 µbar) are shown in Fig. 3. As expected we see from this figure that by increasing the applied power to magnetron, the gas temperature is increased, but it decreases by decreasing the gas pressure. As an example, the results for the variation of
5 The effect of self-absorptionin hollow cathode lamp Cu atoms density with the input power for a pressure of 4.5µbar and also the variation of the deposition rate with the applied power is shown in Fig. 4. Fig. 3. Temperatures as a function of magnetron power. One can conclude that by increasing the pressure the mean free path of particles decreases as λ = 1 2πnd 2, thus leading to an increase in the collision frequency, so the number of atoms excited to metastable state is also increased. We tried to see the effect of the addition of nitrogen gas to the working gas (argon) temperature. The results are shown in Fig. 5. Fig. 4. Variation of density with power for 4.5 µbar. As is seen from this figure, the addition of nitrogen gas, especially for higher pressures causes the reduction in the working gas temperature. This phenomenon is due
6 S. Sobhanian and H. Naghshara to the molecular nature of the nitrogen. The rotational levels of the nitrogen molecule in collision with plasma electrons can acquire some energy from them and the corresponding Boltzmann equilibrium will give a higher temperature. Fig. 5. Temperatures vs. nitrogen percentage. Since there is equilibrium and balance between the rotational and translation degree of freedom of the molecule, some fraction of the additional rotational energy goes to the translation motion. So by addition of some percentages of nitrogen to the working gas, we will have some increase in the temperature. Fig. 6. Absorption for different Te
7 The effect of self-absorptionin hollow cathode lamp The profile of lines emitted by of Cu atoms of HCL is considered to be Gaussian. As it can be seen from Fig. 6, an error would be generated in the exact internal temperature of the lamp when is not used and this may cause a major error in the calculation of I o I i. Fig. 7. Measured density for different lamp current. If the applied current to HCL exceeds the normal value, then Cu atoms density inside the lamp will increase and because of the cylindrical symmetry of the lamp, the density around the main axis becomes greater than that near the internal wall of the copper cylinder inside the HCL. Here the phenomenon called self-absorption (or auto absorption) takes place. In this process, the emission spectra produced by Cu atoms are before leaving the HCL reabsorbed by other Cu atoms, but this absorption is stronger near the middle part of the cylinder, since the density of Cu atoms is higher. Fig. 8. Current influence on absorption rate in this part
8 S. Sobhanian and H. Naghshara This reabsorption distorts the Gaussian profile of the spectral line, because the Cu atoms inside the lamp are not isothermal. So, the calculated internal temperature of the lamp, considering the pro-gaussian profile of the line will give the true temperature. Figure7 shows the difference in the calculated density for two HCL currents 5 ma and 12 ma in a pressure of 14 µbar. This diagram belongs to Cu atoms in the ground state. Giving attention to this curve, we note that for low absorption rates where Cu atom density is decreased, the obtained results for two currents emerge to one similar value, but in the case of high absorption rates, the difference becomes relatively large. This is consistent with the result shown in Fig. 6. So, one must be careful in applying the current to HCL. To find the appropriate current to be used in HCL we carried out an experiment where for a high absorption value inside the plasma, the lamp current is reduced gradually. As Fig. 8 shows the absorption becomes very low and constant for the lamp currents smaller than 5 ma. 4. The effective temperature inside the HCL Considering the above mentioned facts one can conclude that the substitution of the exact value for HCL lamp temperature is very important and major errors might be resulted in the calculated values, especially for high absorption rates. One common method to measure the temperature inside the lamp is to repeat the ROA method used in the experiment for finding the density of atoms for the same conditions and parameters. In the first step, the light from the HCL is passed through the plasma, but in the second stage, the outgoing light is reflected by a mirror and is passed again through the plasma. In these two cases all conditions are similar; except that the absorption length is doubled in the second stage. Thus by doing calculations and solving the equation for the lamp temperature, one can obtain the real temperature. This is a difficult way to determine the effective temperature. To avoid this difficulty we used here the following simple method. Using the experimental arrangement of Fig. 1, we considered two spectral lines of wavelengths nm and nm. Since the population of Cu atoms in the lower level of these two lines are the same and only their oscillation strengths are different, we should obtain the same results for the number density of Cu atoms in the ground state if we use the correct internal temperature of the HCL. The absorption coefficient is defined as A = 1 I o I i where the values close to zero represents low absorption. To obtain the most appropriate value for the internal temperature of HCL, the quantity A(324)-A(327) is plotted against A(327) for same estimated (test) temperatures in figure 9. The experimental values for three different pressure (0.6, 4.5 and 14 µbar) are then superimposed on them. By careful study of this figure the best fitted value for the gas temperature of the HCL is found as 450 K
9 The effect of self-absorptionin hollow cathode lamp 5. Conclusion As it is important to use the exact value of the temperature inside the HCL to get the density of Cu atoms in ground state or exited metastable state moving inside the plasma and thus affecting the deposition rate. Using two main spectral lines of copper in ground states (327 and 324 nm lines), we could calculate the absorption fraction. By fitting the experimental values the absorbed fraction A for different pressures; a value around 450 K is obtained for the temperature of HCL. References 1. Liberman M.A. and Lichtenberg A.J., Principles of Plasma Discharges and Material Processing, (John Wiley & Sons, New York, 1994). 2. Lerner Eric, (The Industrial Physicist, AIP, 1999), pp Reece J., Industrial Plasma Engineering, (Institute of Physics Publishing, Bristol, 1995). 4. Mia L., Tanemura S., Watanabe H., Mori Y., Kaneko K. and Tahshoichi, Journal of Crystal Growth 260, (2004). 5. Mitchell A.C.G. and Zemansky M. W., Resonance Radiation and Exited Atoms, (Cambridge University Press, London, 1971). 6. Kang N., Oh S., Gaboriau F. and Ricard A., Rev. Sci. Instrument 81, (2010). 7. Horikana Y., Kunihara K. and Sasaki K., Journal of Physics: Conference Series 227 (1), (2010). 8. Britum N., Gaillard M. and Han J.G., J. of Phys. D: Applied Physics 41, (2008). 9. Xu L., Sadeghi N., Donnelly V.M. and Economou D.J., Journal of Applied Physics 101, (2007). 10. Naghshara H., Ph-D Thesis, Dept. of Atomic and Molecular Physics, Tabriz University, Tabriz, IRAN. 11. Naghshara H., Shobhanian S., Khorram S. and Sadeghi N., J. of Phys. D: Applied Physics 44, (2011)
Effect of negative ions on the characteristics of plasma in a cylindrical discharge
Araghi and Dorranian Journal of Theoritical and Applied Physics 2013, 7:41 RESEARCH Open Access Effect of negative ions on the characteristics of plasma in a cylindrical discharge Farnaz Araghi and Davoud
More informationDEPOSITION OF THIN TiO 2 FILMS BY DC MAGNETRON SPUTTERING METHOD
Chapter 4 DEPOSITION OF THIN TiO 2 FILMS BY DC MAGNETRON SPUTTERING METHOD 4.1 INTRODUCTION Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering
More informationStudy of DC Cylindrical Magnetron by Langmuir Probe
WDS'2 Proceedings of Contributed Papers, Part II, 76 8, 22. ISBN 978-737825 MATFYZPRESS Study of DC Cylindrical Magnetron by Langmuir Probe A. Kolpaková, P. Kudrna, and M. Tichý Charles University Prague,
More information1. INTRODUCTION 2. EXPERIMENTAL SET-UP CHARACTERIZATION OF A TUBULAR PLASMA REACTOR WITH EXTERNAL ANNULAR ELECTRODES
Romanian Reports in Physics, Vol. 57, No. 3, P. 390-395, 2005 CHARACTERIZATION OF A TUBULAR PLASMA REACTOR WITH EXTERNAL ANNULAR ELECTRODES C. PETCU, B. MITU, G. DINESCU National Institute for Lasers,
More informationChemistry Instrumental Analysis Lecture 17. Chem 4631
Chemistry 4631 Instrumental Analysis Lecture 17 Introduction to Optical Atomic Spectrometry From molecular to elemental analysis there are three major techniques used for elemental analysis: Optical spectrometry
More informationELEMENT2 High Resolution- ICP-MS INSTRUMENT OVERVIEW
ELEMENT2 High Resolution- ICP-MS INSTRUMENT OVERVIEW Inductively Coupled Plasma Mass Spectrometry (ICP-MS) What is a Plasma? - The magnetic field created by a RF (radio frequency) coil produces
More informationBecause light behaves like a wave, we can describe it in one of two ways by its wavelength or by its frequency.
Light We can use different terms to describe light: Color Wavelength Frequency Light is composed of electromagnetic waves that travel through some medium. The properties of the medium determine how light
More information- A spark is passed through the Argon in the presence of the RF field of the coil to initiate the plasma
THE PLASMA Inductively Coupled Plasma Mass Spectrometry (ICP-MS) What is a Plasma? - The magnetic field created by a RF (radio frequency) coil produces a current within a stream of Argon (Ar) gas, which
More informationMONOCHROMATIZATION AND POLARIZATION OF THE NEON SPECTRAL LINES IN CONSTANT/VARIABLE MAGNETIC FIELD
Romanian Reports in Physics 69, 49 (217) MONOCHROMATIZATION AND POLARIZATION OF THE NEON SPECTRAL LINES IN CONSTANT/VARIABLE MAGNETIC FIELD I. GRUIA, L.C. CIOBOTARU* University of Bucharest, Faculty of
More informationUnit-2 LASER. Syllabus: Properties of lasers, types of lasers, derivation of Einstein A & B Coefficients, Working He-Ne and Ruby lasers.
Unit-2 LASER Syllabus: Properties of lasers, types of lasers, derivation of Einstein A & B Coefficients, Working He-Ne and Ruby lasers. Page 1 LASER: The word LASER is acronym for light amplification by
More informationElectrical Discharges Characterization of Planar Sputtering System
International Journal of Recent Research and Review, Vol. V, March 213 ISSN 2277 8322 Electrical Discharges Characterization of Planar Sputtering System Bahaa T. Chaid 1, Nathera Abass Ali Al-Tememee 2,
More informationTHE INFLUENCE OF EXTERNAL MAGNETIC FIELD ON THE RADIATION EMITTED BY NEGATIVE GLOW OF A DC GLOW DISCHARGE
PLASMA PHYSICS THE INFLUENCE OF EXTERNAL MAGNETIC FIELD ON THE RADIATION EMITTED BY NEGATIVE GLOW OF A DC GLOW DISCHARGE M. TOMA, I. A. RUSU, D. O. DOROHOI Plasma Physics Department, A. I. Cuza University,
More informationa. An emission line as close as possible to the analyte resonance line
Practice Problem Set 5 Atomic Emission Spectroscopy 10-1 What is an internal standard and why is it used? An internal standard is a substance added to samples, blank, and standards. The ratio of the signal
More informationOptical Atomic Spectroscopy
Optical Atomic Spectroscopy Methods to measure conentrations of primarily metallic elements at < ppm levels with high selectivity! Two main optical methodologies- -Atomic Absorption--need ground state
More informationRadionuclide Imaging MII Detection of Nuclear Emission
Radionuclide Imaging MII 3073 Detection of Nuclear Emission Nuclear radiation detectors Detectors that are commonly used in nuclear medicine: 1. Gas-filled detectors 2. Scintillation detectors 3. Semiconductor
More informationPHYSICAL VAPOR DEPOSITION OF THIN FILMS
PHYSICAL VAPOR DEPOSITION OF THIN FILMS JOHN E. MAHAN Colorado State University A Wiley-Interscience Publication JOHN WILEY & SONS, INC. New York Chichester Weinheim Brisbane Singapore Toronto CONTENTS
More informationPhotoelectron spectroscopy Instrumentation. Nanomaterials characterization 2
Photoelectron spectroscopy Instrumentation Nanomaterials characterization 2 RNDr. Věra V Vodičkov ková,, PhD. Photoelectron Spectroscopy general scheme Impact of X-ray emitted from source to the sample
More information3 - Atomic Absorption Spectroscopy
3 - Atomic Absorption Spectroscopy Introduction Atomic-absorption (AA) spectroscopy uses the absorption of light to measure the concentration of gas-phase atoms. Since samples are usually liquids or solids,
More informationAssessment of the Azimuthal Homogeneity of the Neutral Gas in a Hall Effect Thruster using Electron Beam Fluorescence
Assessment of the Azimuthal Homogeneity of the Neutral Gas in a Hall Effect Thruster using Electron Beam Fluorescence IEPC-2015-91059 / ISTS-2015-b-91059 Presented at Joint Conference of 30th International
More informationAtomization. In Flame Emission
FLAME SPECTROSCOPY The concentration of an element in a solution is determined by measuring the absorption, emission or fluorescence of electromagnetic by its monatomic particles in gaseous state in the
More informationAdjustment of electron temperature in ECR microwave plasma
Vacuum (3) 53 Adjustment of electron temperature in ECR microwave plasma Ru-Juan Zhan a, Xiaohui Wen a,b, *, Xiaodong Zhu a,b, Aidi zhao a,b a Structure Research Laboratory, University of Science and Technology
More informationTMT4320 Nanomaterials November 10 th, Thin films by physical/chemical methods (From chapter 24 and 25)
1 TMT4320 Nanomaterials November 10 th, 2015 Thin films by physical/chemical methods (From chapter 24 and 25) 2 Thin films by physical/chemical methods Vapor-phase growth (compared to liquid-phase growth)
More informationAtomic Emission Spectroscopy
Atomic Emission Spectroscopy Ahmad Aqel Ifseisi Assistant Professor of Analytical Chemistry College of Science, Department of Chemistry King Saud University P.O. Box 2455 Riyadh 11451 Saudi Arabia Building:
More informationA novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS)
IOP Conference Series: Materials Science and Engineering A novel sputtering technique: Inductively Coupled Impulse Sputtering (ICIS) To cite this article: D A L Loch and A P Ehiasarian 2012 IOP Conf. Ser.:
More informationModel Answer (Paper code: AR-7112) M. Sc. (Physics) IV Semester Paper I: Laser Physics and Spectroscopy
Model Answer (Paper code: AR-7112) M. Sc. (Physics) IV Semester Paper I: Laser Physics and Spectroscopy Section I Q1. Answer (i) (b) (ii) (d) (iii) (c) (iv) (c) (v) (a) (vi) (b) (vii) (b) (viii) (a) (ix)
More informationCHARACTERIZATION OF A DC PLASMA WITH HOLLOW CATHODE EFFECT
Romanian Reports in Phisics, Vol. 56, No., P. 71-76, 004 CHARACTERIZATION OF A DC PLASMA WITH HOLLOW CATHODE EFFECT A. R. PETRE 1, M. BÃZÃVAN 1, V. COVLEA 1, V.V. COVLEA 1, ISABELLA IOANA OPREA, H. ANDREI
More informationPRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING
PRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING Second Edition MICHAEL A. LIEBERMAN ALLAN J, LICHTENBERG WILEY- INTERSCIENCE A JOHN WILEY & SONS, INC PUBLICATION CONTENTS PREFACE xrrii PREFACE
More informationElectron temperature is the temperature that describes, through Maxwell's law, the kinetic energy distribution of the free electrons.
10.3.1.1 Excitation and radiation of spectra 10.3.1.1.1 Plasmas A plasma of the type occurring in spectrochemical radiation sources may be described as a gas which is at least partly ionized and contains
More informationTwo-electron systems
Two-electron systems Laboratory exercise for FYSC11 Instructor: Hampus Nilsson hampus.nilsson@astro.lu.se Lund Observatory Lund University September 12, 2016 Goal In this laboration we will make use of
More informationModern Methods in Heterogeneous Catalysis Research: Preparation of Model Systems by Physical Methods
Modern Methods in Heterogeneous Catalysis Research: Preparation of Model Systems by Physical Methods Methods for catalyst preparation Methods discussed in this lecture Physical vapour deposition - PLD
More informationMetal Deposition. Filament Evaporation E-beam Evaporation Sputter Deposition
Metal Deposition Filament Evaporation E-beam Evaporation Sputter Deposition 1 Filament evaporation metals are raised to their melting point by resistive heating under vacuum metal pellets are placed on
More informationChaotic-to-ordered state transition of cathode-sheath instabilities in DC glow discharge plasmas
PRAMANA c Indian Academy of Sciences Vol. 67, No. 2 journal of August 2006 physics pp. 299 304 Chaotic-to-ordered state transition of cathode-sheath instabilities in DC glow discharge plasmas MD NURUJJAMAN
More informationElectron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor
WDS'06 Proceedings of Contributed Papers, Part II, 150 155, 2006. ISBN 80-86732-85-1 MATFYZPRESS Electron Density and Ion Flux in Diffusion Chamber of Low Pressure RF Helicon Reactor R. Šmíd Masaryk University,
More informationCharacterization of the operation of RITs with iodine
Characterization of the operation of RITs with iodine IEPC-2017-368 Presented at the 35th International Electric Propulsion Conference Georgia Institute of Technology Atlanta, Georgia USA Waldemar Gärtner
More informationTIME RESOLVED TUNABLE DIODE LASER ABSORPTION SPECTROSCOPY ON Al AND Ar M ATOMS IN HIGH POWER PULSED MAGNETRON SPUTTERING *
TIME RESOLVED TUNABLE DIODE LASER ABSORPTION SPECTROSCOPY ON Al AND Ar M ATOMS IN HIGH POWER PULSED MAGNETRON SPUTTERING * C. VITELARU 1,2, T. MINEA 2, L. DE POUCQUES 3, M. GANCIU 2,4, G. POPA 1 1 Faculty
More informationChemistry Instrumental Analysis Lecture 19 Chapter 12. Chem 4631
Chemistry 4631 Instrumental Analysis Lecture 19 Chapter 12 There are three major techniques used for elemental analysis: Optical spectrometry Mass spectrometry X-ray spectrometry X-ray Techniques include:
More informationChapter 5: Nanoparticle Production from Cathode Sputtering. in High-Pressure Microhollow Cathode and Arc Discharges
96 Chapter 5: Nanoparticle Production from Cathode Sputtering in High-Pressure Microhollow Cathode and Arc Discharges 5.1. Introduction Sputtering is a fundamental aspect of plasma operation and has been
More informationReference literature. (See: CHEM 2470 notes, Module 8 Textbook 6th ed., Chapters )
September 17, 2018 Reference literature (See: CHEM 2470 notes, Module 8 Textbook 6th ed., Chapters 13-14 ) Reference.: https://slideplayer.com/slide/8354408/ Spectroscopy Usual Wavelength Type of Quantum
More informationParticle Detectors and Quantum Physics (2) Stefan Westerhoff Columbia University NYSPT Summer Institute 2002
Particle Detectors and Quantum Physics (2) Stefan Westerhoff Columbia University NYSPT Summer Institute 2002 More Quantum Physics We know now how to detect light (or photons) One possibility to detect
More informationTheory of Gas Discharge
Boris M. Smirnov Theory of Gas Discharge Plasma l Springer Contents 1 Introduction 1 Part I Processes in Gas Discharge Plasma 2 Properties of Gas Discharge Plasma 13 2.1 Equilibria and Distributions of
More informationInvestigation of Water Fragments
National Nuclear Research University MEPhI Federal State Autonomous Institution for Higher Education 31 Kashirskoe shosse 115409 Moscow, Russia VAT registration number, 7724068140 REG. No 1037739366477
More informationAdvanced Lab Course. X-Ray Photoelectron Spectroscopy 1 INTRODUCTION 1 2 BASICS 1 3 EXPERIMENT Qualitative analysis Chemical Shifts 7
Advanced Lab Course X-Ray Photoelectron Spectroscopy M210 As of: 2015-04-01 Aim: Chemical analysis of surfaces. Content 1 INTRODUCTION 1 2 BASICS 1 3 EXPERIMENT 3 3.1 Qualitative analysis 6 3.2 Chemical
More informationPlasma Processing of Large Curved Surfaces for SRF Cavity Modification
Plasma Processing of Large Curved Surfaces for SRF Cavity Modification J. Upadhyay, 1 Do Im, 1 S. Popović, 1 A.-M. Valente-Feliciano, 2 L. Phillips, 2 and L. Vušković 1 1 Department of Physics - Center
More informationPulsed Laser Deposition; laser ablation. Final apresentation for TPPM Diogo Canavarro, MEFT
Pulsed Laser Deposition; laser ablation Final apresentation for TPPM Diogo Canavarro, 56112 MEFT Summary What is PLD? What is the purpose of PLD? How PLD works? Experimental Setup Processes in PLD The
More informationRepetition: Practical Aspects
Repetition: Practical Aspects Reduction of the Cathode Dark Space! E x 0 Geometric limit of the extension of a sputter plant. Lowest distance between target and substrate V Cathode (Target/Source) - +
More informationComplete the following. Clearly mark your answers. YOU MUST SHOW YOUR WORK TO RECEIVE CREDIT.
CHEM 322 Name Exam 3 Spring 2013 Complete the following. Clearly mark your answers. YOU MUST SHOW YOUR WORK TO RECEIVE CREDIT. Warm-up (3 points each). 1. In Raman Spectroscopy, molecules are promoted
More informationA simple electric thruster based on ion charge exchange
A simple electric thruster based on ion charge exchange IEPC-2007-35 Presented at the 30 th International Electric Propulsion Conference, Florence, Italy Joe Khachan and Lachlan Blackhall University of
More informationhigh temp ( K) Chapter 20: Atomic Spectroscopy
high temp (2000-6000K) Chapter 20: Atomic Spectroscopy 20-1. An Overview Most compounds Atoms in gas phase high temp (2000-6000K) (AES) (AAS) (AFS) sample Mass-to-charge (ICP-MS) Atomic Absorption experiment
More informationAMS MEASUREMENTS OF DEUTERIUM CAPTURED IN TUNGSTEN LAYERS DEPOSITED BY MAGNETRON SPUTTERING
Romanian Reports in Physics, Vol. 65, No. 4, P. 1258 1264, 2013 AMS MEASUREMENTS OF DEUTERIUM CAPTURED IN TUNGSTEN LAYERS DEPOSITED BY MAGNETRON SPUTTERING A.R. PETRE 1,3, T. ACSENTE 2, M. ENACHESCU 1,
More informationMODERN OPTICS. P47 Optics: Unit 9
MODERN OPTICS P47 Optics: Unit 9 Course Outline Unit 1: Electromagnetic Waves Unit 2: Interaction with Matter Unit 3: Geometric Optics Unit 4: Superposition of Waves Unit 5: Polarization Unit 6: Interference
More informationLASERS. Dr D. Arun Kumar Assistant Professor Department of Physical Sciences Bannari Amman Institute of Technology Sathyamangalam
LASERS Dr D. Arun Kumar Assistant Professor Department of Physical Sciences Bannari Amman Institute of Technology Sathyamangalam General Objective To understand the principle, characteristics and types
More informationChapter 24 Photonics Question 1 Question 2 Question 3 Question 4 Question 5
Chapter 24 Photonics Data throughout this chapter: e = 1.6 10 19 C; h = 6.63 10 34 Js (or 4.14 10 15 ev s); m e = 9.1 10 31 kg; c = 3.0 10 8 m s 1 Question 1 Visible light has a range of photons with wavelengths
More informationIR Spectrography - Absorption. Raman Spectrography - Scattering. n 0 n M - Raman n 0 - Rayleigh
RAMAN SPECTROSCOPY Scattering Mid-IR and NIR require absorption of radiation from a ground level to an excited state, requires matching of radiation from source with difference in energy states. Raman
More informationINTRODUCTION Strained Silicon Monochromator Magnesium Housing Windows for Monochromator Shutter and Collimator Fission Detector HOPG Monochromator
Design for a Four-Blade Neutron Interferometer INTRODUCTION Strained Silicon Monochromator The neutron beam used for this interferometer is separated from the NIST reactor's main beam using a strained
More informationPROCESS MONITORING OF PLASMA ELECTROLYTIC OXIDATION J.-W. Liaw, C.-C. Hsiao, Clinton Fong, Y.-L. Tsai, S.-C. Chung, Oleg Demin Materials Research
PROCESS MONITORING OF PLASMA ELECTROLYTIC OXIDATION J.-W. Liaw, C.-C. Hsiao, Clinton Fong, Y.-L. Tsai, S.-C. Chung, Oleg Demin Materials Research Laboratories, Industrial Technology Research Institute,
More informationThe Light during Gravitational Super-Compressibility
Journal of Modern Physics, 2013, 4, 468-473 http://dx.doi.org/10.4236/jmp.2013.44066 Published Online April 2013 (http://www.scirp.org/journal/jmp) The Light during Gravitational Super-Compressibility
More information2101 Atomic Spectroscopy
2101 Atomic Spectroscopy Atomic identification Atomic spectroscopy refers to the absorption and emission of ultraviolet to visible light by atoms and monoatomic ions. It is best used to analyze metals.
More informationChemistry Instrumental Analysis Lecture 5. Chem 4631
Chemistry 4631 Instrumental Analysis Lecture 5 Light Amplification by Stimulated Emission of Radiation High Intensities Narrow Bandwidths Coherent Outputs Applications CD/DVD Readers Fiber Optics Spectroscopy
More informationOptics, Light and Lasers
Dieter Meschede Optics, Light and Lasers The Practical Approach to Modern Aspects of Photonics and Laser Physics Second, Revised and Enlarged Edition BICENTENNIAL.... n 4 '':- t' 1 8 0 7 $W1LEY 2007 tri
More informationRaman and stimulated Raman spectroscopy of chlorinated hydrocarbons
Department of Chemistry Physical Chemistry Göteborg University KEN140 Spektroskopi Raman and stimulated Raman spectroscopy of chlorinated hydrocarbons WARNING! The laser gives a pulsed very energetic and
More informationMICROCHIP MANUFACTURING by S. Wolf
by S. Wolf Chapter 15 ALUMINUM THIN-FILMS and SPUTTER-DEPOSITION 2004 by LATTICE PRESS CHAPTER 15 - CONTENTS Aluminum Thin-Films Sputter-Deposition Process Steps Physics of Sputter-Deposition Magnetron-Sputtering
More informationCombinatorial RF Magnetron Sputtering for Rapid Materials Discovery: Methodology and Applications
Combinatorial RF Magnetron Sputtering for Rapid Materials Discovery: Methodology and Applications Philip D. Rack,, Jason D. Fowlkes,, and Yuepeng Deng Department of Materials Science and Engineering University
More informationInvestigation of H 2 :CH 4 Plasma Composition by Means of Spatially Resolved Optical Spectroscopy
Vol. 114 (2008) ACTA PHYSICA POLONICA A No. 6 A Optical and Acoustical Methods in Science and Technology Investigation of H 2 :CH 4 Plasma Composition by Means of Spatially Resolved Optical Spectroscopy
More informationk T m 8 B P m k T M T
I. INTRODUCTION AND OBJECTIVE OF THE EXPERIENT The techniques for evaporation of chemicals in a vacuum are widely used for thin film deposition on rigid substrates, leading to multiple applications: production
More informationComparison of hollow cathode and Penning discharges for metastable He production
INSTITUTE OF PHYSICS PUBLISHING Plasma Sources Sci. Technol. 11 (2002) 426 430 Comparison of hollow cathode and Penning discharges for metastable He production PLASMA SOURCES SCIENCE AND TECHNOLOGY PII:
More information6.5 Optical-Coating-Deposition Technologies
92 Chapter 6 6.5 Optical-Coating-Deposition Technologies The coating process takes place in an evaporation chamber with a fully controlled system for the specified requirements. Typical systems are depicted
More informationINFLUENCE OF MAGNETIC FIELD ON MONOCHROME VISIBLE LIGHT IN ELECTROPOSITIVE ELECTRONEGATIVE GAS MIXTURES DISCHARGES PLASMA
THE PUBLISHING HOUSE PROCEEDINGS OF THE ROMANIAN ACADEMY, Series A, OF THE ROMANIAN ACADEMY Volume 7, Number /, pp. 3 3 INFLUENCE OF MAGNETIC FIELD ON MONOCHROME VISIBLE LIGHT IN ELECTROPOSITIVE ELECTRONEGATIVE
More informationLasers & Holography. Ulrich Heintz Brown University. 4/5/2016 Ulrich Heintz - PHYS 1560 Lecture 10 1
Lasers & Holography Ulrich Heintz Brown University 4/5/2016 Ulrich Heintz - PHYS 1560 Lecture 10 1 Lecture schedule Date Topic Thu, Jan 28 Introductory meeting Tue, Feb 2 Safety training Thu, Feb 4 Lab
More informationIonization Detectors. Mostly Gaseous Detectors
Ionization Detectors Mostly Gaseous Detectors Introduction Ionization detectors were the first electrical devices developed for radiation detection During the first half of the century: 3 basic types of
More informationSPECTRAL INVESTIGATION OF A COMPLEX SPACE CHARGE STRUCTURE IN PLASMA
SPECTRAL INVESTIGATION OF A COMPLEX SPACE CHARGE STRUCTURE IN PLASMA S. GURLUI 1, D. G. DIMITRIU 1, C. IONITA 2, R. W. SCHRITTWIESER 2 1 Faculty of Physics, Al. I. Cuza University, 11 Carol I Blvd., RO-700506
More informationGaetano L Episcopo. Scanning Electron Microscopy Focus Ion Beam and. Pulsed Plasma Deposition
Gaetano L Episcopo Scanning Electron Microscopy Focus Ion Beam and Pulsed Plasma Deposition Hystorical background Scientific discoveries 1897: J. Thomson discovers the electron. 1924: L. de Broglie propose
More informationINTRODUCTION Atomic fluorescence spectroscopy ( AFS ) depends on the measurement of the emission ( fluorescence ) emitted from gasphase analyte atoms
INTRODUCTION Atomic fluorescence spectroscopy ( AFS ) depends on the measurement of the emission ( fluorescence ) emitted from gasphase analyte atoms that have been excited to higher energy levels by absorption
More informationTrapping of slow-speed particles in a gas cell by the nonhomogeneous electromagnetic field intensifying with time
Trapping of slow-speed particles in a gas cell by the nonhomogeneous electromagnetic field intensifying with time Azad Ch. Izmailov Institute of Physics, Azerbaijan National Academy of Sciences, Javid
More informationApplication of Plasma Phenomena Lecture /3/21
Application of Plasma Phenomena Lecture 3 2018/3/21 2018/3/21 updated 1 Reference Industrial plasma engineering, volume 1, by J. Reece Roth, Chapter 8-13. Plasma physics and engineering, by Alexander Fridman
More informationIntroduction to Plasma
What is a plasma? The fourth state of matter A partially ionized gas How is a plasma created? Energy must be added to a gas in the form of: Heat: Temperatures must be in excess of 4000 O C Radiation Electric
More informationPractical 1P4 Energy Levels and Band Gaps
Practical 1P4 Energy Levels and Band Gaps What you should learn from this practical Science This practical illustrates some of the points from the lecture course on Elementary Quantum Mechanics and Bonding
More informationAtomic Absorption Spectrophotometry. Presentation by, Mrs. Sangita J. Chandratre Department of Microbiology M. J. college, Jalgaon
Atomic Absorption Spectrophotometry Presentation by, Mrs. Sangita J. Chandratre Department of Microbiology M. J. college, Jalgaon Defination In analytical chemistry, Atomic absorption spectroscopy is a
More informationChapter 4 Scintillation Detectors
Med Phys 4RA3, 4RB3/6R03 Radioisotopes and Radiation Methodology 4-1 4.1. Basic principle of the scintillator Chapter 4 Scintillation Detectors Scintillator Light sensor Ionizing radiation Light (visible,
More informationThe near-infrared spectra and distribution of excited states of electrodeless discharge rubidium vapour lamps
The near-infrared spectra and distribution of excited states of electrodeless discharge rubidium vapour lamps Sun Qin-Qing( ) a)b), Miao Xin-Yu( ) a), Sheng Rong-Wu( ) c), and Chen Jing-Biao( ) a)b) a)
More informationDiagnósticos em Plasmas
Tecnologia a Plasma para o Processamento de Materiais Diagnósticos em Plasmas Diagnósticos Ópticos João Santos Sousa, nº50901 Semestre Inverno 2004/2005 21 de Janeiro de 2005, 9h-10h, sala F8 Contents
More informationCoulomb crystal extraction from an ion trap for application to nano-beam source"
Coulomb crystal extraction from an ion trap for application to nano-beam source" K. Ito, K. Izawa, H. Higaki and H. Okamoto,! Aadvanced Sciences of Matter, Hiroshima University,! 1-3-1 Kagamiyama, Higashi-Hiroshima,
More informationUltra-High Vacuum Technology. Sputter Ion Pumps l/s
Ultra-High Vacuum Technology 30-400 l/s 181.06.01 Excerpt from the Product Chapter C15 Edition November 2007 Contents General General..........................................................................
More informationPhotoelectron Spectroscopy using High Order Harmonic Generation
Photoelectron Spectroscopy using High Order Harmonic Generation Alana Ogata Yamanouchi Lab, University of Tokyo ABSTRACT The analysis of photochemical processes has been previously limited by the short
More informationB.Tech. First Semester Examination Physics-1 (PHY-101F)
B.Tech. First Semester Examination Physics-1 (PHY-101F) Note : Attempt FIVE questions in all taking least two questions from each Part. All questions carry equal marks Part-A Q. 1. (a) What are Newton's
More informationAtomic Absorption Spectroscopy
CH 2252 Instrumental Methods of Analysis Unit IV Atomic Absorption Spectroscopy Dr. M. Subramanian Associate Professor Department of Chemical Engineering Sri Sivasubramaniya Nadar College of Engineering
More informationChapter-4 Stimulated emission devices LASERS
Semiconductor Laser Diodes Chapter-4 Stimulated emission devices LASERS The Road Ahead Lasers Basic Principles Applications Gas Lasers Semiconductor Lasers Semiconductor Lasers in Optical Networks Improvement
More informationA few Experimental methods for optical spectroscopy Classical methods Modern methods. Remember class #1 Generating fast LASER pulses
A few Experimental methods for optical spectroscopy Classical methods Modern methods Shorter class Remember class #1 Generating fast LASER pulses, 2017 Uwe Burghaus, Fargo, ND, USA W. Demtröder, Laser
More informationChemistry Instrumental Analysis Lecture 34. Chem 4631
Chemistry 4631 Instrumental Analysis Lecture 34 From molecular to elemental analysis there are three major techniques used for elemental analysis: Optical spectrometry Mass spectrometry X-ray spectrometry
More informationFranck-Hertz Experiment
Franck-Hertz Experiment Introduction: In 1914, James Franck and Gustav Hertz discovered in the course of their investigations an energy loss in distinct steps for electrons passing through mercury vapor,
More informationvacuum analysis plasma diagnostics surface science gas analysis
Hiden EQP Systems High Sensitivity Mass and Energy Analysers for Monitoring, Control and Characterisation of Ions, Neutrals and Radicals in Plasma. vacuum analysis surface science gas analysis plasma diagnostics
More informationEMISSION SPECTROSCOPY
IFM The Department of Physics, Chemistry and Biology LAB 57 EMISSION SPECTROSCOPY NAME PERSONAL NUMBER DATE APPROVED I. OBJECTIVES - Understand the principle of atomic emission spectra. - Know how to acquire
More informationWhat Makes a Laser Light Amplification by Stimulated Emission of Radiation Main Requirements of the Laser Laser Gain Medium (provides the light
What Makes a Laser Light Amplification by Stimulated Emission of Radiation Main Requirements of the Laser Laser Gain Medium (provides the light amplification) Optical Resonator Cavity (greatly increase
More informationLaser Types Two main types depending on time operation Continuous Wave (CW) Pulsed operation Pulsed is easier, CW more useful
Main Requirements of the Laser Optical Resonator Cavity Laser Gain Medium of 2, 3 or 4 level types in the Cavity Sufficient means of Excitation (called pumping) eg. light, current, chemical reaction Population
More informationChemistry 311: Instrumentation Analysis Topic 2: Atomic Spectroscopy. Chemistry 311: Instrumentation Analysis Topic 2: Atomic Spectroscopy
Topic 2b: X-ray Fluorescence Spectrometry Text: Chapter 12 Rouessac (1 week) 4.0 X-ray Fluorescence Download, read and understand EPA method 6010C ICP-OES Winter 2009 Page 1 Atomic X-ray Spectrometry Fundamental
More informationlaser with Q-switching for generation of terahertz radiation Multiline CO 2 Journal of Physics: Conference Series PAPER OPEN ACCESS
Journal of Physics: Conference Series PAPER OPEN ACCESS Multiline CO 2 laser with Q-switching for generation of terahertz radiation To cite this article: A A Ionin et al 2017 J. Phys.: Conf. Ser. 941 012004
More informationVacuum Pumps. Two general classes exist: Gas transfer physical removal of matter. Mechanical, diffusion, turbomolecular
Vacuum Technology Vacuum Pumps Two general classes exist: Gas transfer physical removal of matter Mechanical, diffusion, turbomolecular Adsorption entrapment of matter Cryo, sublimation, ion Mechanical
More informationEMISSION SPECTROSCOPY OF DIPOLAR PLASMA SOURCE IN LOW PRESSURE HYDROGEN
EMISSION SPECTROSCOPY OF DIPOLAR PLASMA SOURCE IN LOW PRESSURE HYDROGEN S. Bechu 1, A. Lacoste 1, Yu. A. Lebedev 2, V. A. Shakhatov 2 1 Centre de Recherché, Plasma Materiaux Nanostructures (CRPMN), Grenoble,
More information1 AT/P5-05. Institute of Applied Physics, National Academy of Sciences of Ukraine, Sumy, Ukraine
1 AT/P5-05 H - Ion Source with Inverse Gas Magnetron Geometry for SNS Project V.A. Baturin, P.A. Litvinov, S.A. Pustovoitov, A.Yu. Karpenko Institute of Applied Physics, National Academy of Sciences of
More informationPIC/MCC Simulation of Radio Frequency Hollow Cathode Discharge in Nitrogen
PIC/MCC Simulation of Radio Frequency Hollow Cathode Discharge in Nitrogen HAN Qing ( ), WANG Jing ( ), ZHANG Lianzhu ( ) College of Physics Science and Information Engineering, Hebei Normal University,
More informationExperiment 3 1. The Michelson Interferometer and the He- Ne Laser Physics 2150 Experiment No. 3 University of Colorado
Experiment 3 1 Introduction The Michelson Interferometer and the He- Ne Laser Physics 2150 Experiment No. 3 University of Colorado The Michelson interferometer is one example of an optical interferometer.
More information